Burchard Lab (513) and Carnegie Lab
Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:
Fabrication/Preparation
Thermal Evaporator (LADD Research)
Pulsed Laser Deposition System using Nd:YAG Laser (wavelength: 355nm) with a vacuum chamber
Critical Point Dryer (Tousimis Samdri 780A)
Home-built XYZ Theta Transfer Stage
Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: (Lindberg/Blue STF55346C)
4 Low Pressure Chemical Vapor Deposition (LPCVD) Systems: (MTI OTF-1200X)
Characterization
AFM System (Nanonics MV1000 and MV2000)
Raman Spectrometer (Horiba XPLORA)
Digital Microscope (Hirox KH300LCD)
Goniometer/Tensiometer (Ramé-Hart Model 250)
Electrical Measurements
Galvanostat/Potentiostat (Princeton Applied Research 263A-1)
Spectrum Analyzer (Advantest R3131A)
Signal Waveform Generator (Agilent 33250A)
Digital Oscilloscope (GW-INSTEK GOS-620)
Source Meter (Keithley 6487) instrument)
Additional
Chemical Storage Refrigerator
Fume Hood (Saint Charles)
Scale (Acculab ALC 80.4)
Hot Plates (VWR and PMC Dataplate 720)
Clean Room
The multi-user Micro Device Laboratory is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.