Research Facilities

Burchard Lab (513) and Carnegie Lab

Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:


  • Graphene Square TCVD50B

  • Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: (Lindberg/Blue STF55346C) 

  • 4 Low Pressure Chemical Vapor Deposition (LPCVD) Systems: (MTI OTF-1200X) 

  • Home-built XYZ Theta Transfer Stage

  • Critical Point Dryer (Tousimis Samdri 780A)

  • Ultrasonic bath (Digital Pro)

  • Centrifuge 5418 (Eppendorf)


  • AFM System (Nanonics MV1000 and MV2000)

  • Raman Spectrometer (Horiba XPLORA)

  • Digital Microscope (Hirox KH300LCD)

  • Goniometer/Tensiometer (Ramé-Hart Model 250)

  • Cryostat ST-500 (Lakeshore Cryptonics)

  • Home-built Probe station with laser excitation source 405 nm, 532 nm and 650 nm (KeyFactor System and Lights88)

  • Optical Microscope (AmScope)

Electrical Measurements

  • Galvanostat/Potentiostat (Princeton Applied Research 263A-1)

  • Spectrum Analyzer (Advantest R3131A)

  • Signal Waveform Generator (Agilent 33250A)

  • Digital Oscilloscope (GW-INSTEK GOS-620)

  • Source Meter (Keithley 6487 instrument)

Microfabrication Facility

The multi-user Micro Device Laboratory is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.

Imaging Facility

The multi-user Laboratory for Multiscale Imaging (LMSI) provides state-of-the-art instrumentation and expertise in morphological characterization to support and elevate research, and it helps leverage Stevens' capabilities to attract further support for new and significant self-sustaining programs.