Research Facilities

Burchard Lab (513) and Carnegie Lab

Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:


  • Thermal Evaporator (LADD Research)

  • Pulsed Laser Deposition System using Nd:YAG Laser (wavelength: 355nm) with a vacuum chamber

  • Critical Point Dryer (Tousimis Samdri 780A)

  • Home-built XYZ Theta Transfer Stage

  • Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: (Lindberg/Blue STF55346C) 

  • 4 Low Pressure Chemical Vapor Deposition (LPCVD) Systems: (MTI OTF-1200X) 


  • AFM System (Nanonics MV1000 and MV2000)

  • Raman Spectrometer (Horiba XPLORA)

  • Digital Microscope (Hirox KH300LCD)

  • Goniometer/Tensiometer (Ramé-Hart Model 250)

Electrical Measurements

  • Galvanostat/Potentiostat (Princeton Applied Research 263A-1)

  • Spectrum Analyzer (Advantest R3131A)

  • Signal Waveform Generator (Agilent 33250A)

  • Digital Oscilloscope (GW-INSTEK GOS-620)

  • Source Meter (Keithley 6487) instrument)


  • Chemical Storage Refrigerator

  • Fume Hood (Saint Charles)

  • Scale (Acculab ALC 80.4)

  • Hot Plates (VWR and PMC Dataplate 720)

Clean Room

The multi-user Micro Device Laboratory is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.