MicroDevice Laboratory

The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet cleanroom at Stevens Institute of Technology.

Mission

Mission

The MicroDevice Laboratory (MDL) is an Institute multiuser facility whose mission is to provide cutting edge nanofabrication and characterization facilities to support the research and educational programs of then Institute. It furthermore provides hands-on research opportunities for undergraduate and graduate students.

Lab Director

Dr. Chang-Hwan Choi

Lab Staff

Dr. Kyungnam Kang (2013-current)
Postdoctoral Scholar
Ph.D. from Louisiana State University
Research: 2D materials

MicroDevice Lab Capabilities

Lithography

Mask aligner, Spin coater, Nanoimprintor, Bake ovens, Wet bench, Microscope

Device Testing

Probe station, SEM, Microscope

Etch & Deposition

DRIE, ICP, XeF2 etcher, Wet etch bench, PVD, Thermal evaporator, MVD

Facility Overview

The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet clean room at Stevens Institute of Technology. 

People

Name

Research Topic

Abdus Salam Sarkar

2D materials

Chao Sui

Tissue/organ-on-chip and immunotherapy 

Elham Easy

Study of microstructure of additive manufacturing devices  

Greg Hader

Nano-sheet resonators

Hearsh Hoshing

Hibal Ahmad

Thermal conductivity

Javid Akhavan Taheri Boroujeni

3D printing

Jeric Hernandez

2D material for thermoelectric measurement

Jongyoun Son

ME Lab manager

Ke Xu

Licheng Xiao

Kyungnam Kang

MDL manager

Mengqi Fang

2D material growth

Na Liu

2D material optical property measurement

Seyed S Mohajerani

Seyed Mohammad Hosseini

3D printing

Shuai Yu

pHEMA hydrogel fabrication

Siwei Chen

MTJ fabrication

Yazhou Zhou

Yingtao Wang

Graphene device

Youmna Mahmoud

3D printing

Yunong Tang

2D materials fabrication

Zheqi Li

Carbon nanotubes

Zitao Tang

Graphene ring

User Fees

Equipment

Hourly fee $ for Stevens Users (1 hour minimum)

Hourly fee $ for External Users 

Note

Mask aligner (MA6)

50

100

PVD

50 (excluding pumping time)

100 (excluding pumping time)

user brings crucibles/targets

DRIE

100

200

ICP etcher

100

200

XeF2 etcher

50

100

Nanoimprintor

50

100

user brings mold photoresists

Probe station

50

100

O2 Plasma

50

100

Spin coater, oven, hot plates, hood

50 (exempted if using with MA6 or etchers)

100 (exempted if using with MA6 or etchers)

user brings photoresists/developers

SEM

50

100

AFM

50

100

user brings AFM tips

Equipment training

200

300

Equipment operated by staff

100 + equipment hourly fee

100 + equipment hourly fee