MicroDevice Laboratory

The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet cleanroom at Stevens Institute of Technology.

Mission

Mission

The MicroDevice Laboratory (MDL) is an Institute multiuser facility whose mission is to provide cutting edge nanofabrication and characterization facilities to support the research and educational programs of then Institute. It furthermore provides hands-on research opportunities for undergraduate and graduate students.

Lab Director

Dr. Chang-Hwan Choi

Lab Staff

Dr. Kyungnam Kang (2013-current)
Postdoctoral Scholar
Ph.D. from Louisiana State University
Research: 2D materials

MicroDevice Lab Capabilities

Lithography

Mask aligner, Spin coater, Nanoimprintor, Bake ovens, Wet bench, Microscope

Device Testing

Probe station, SEM, Microscope

Etch & Deposition

DRIE, ICP, XeF2 etcher, Wet etch bench, PVD, Thermal evaporator, MVD

Facility Overview

The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet clean room at Stevens Institute of Technology. 

Equipment

The following pieces of equipment will be available within the facility: 

A complete lithography system including Mask Aligner (Karl Suss MA6), Nanoimprintor (Nanonex), Spin Coater/Drier (Headway Research), Solvent Bench (Clean Air Products), Wet Etch Bench (Clean Air Products), Laminar Hood, Hotplate System (Alpha Multiservices), Ovens (Alpha Multiservices), and Surface treatment (O2 plasma) are available.

For characterization, Environmental Scanning Electron Microscope (SEM, FEI) is also available.

For deposition, Physical Vapor Deposition (PVD, Denton Vacuum), Thermal Evaporator (Ladd Research), Sputter Coater (Pelco), and Molecular Vapor Deposition (Applied MST) are installed. In addition, Deep Reactive Ion Etcher (DRIE, BMRTek), XeF2 Etcher (Xactix), and Inductively Coupled Plasma Etcher (ICP, BMRTek) are available along with other testing equipment such as Microscope (Nikon) and Probe Station (Signatone).

Lithography

  • Hot plate

  • Convection oven: Barnstead Lab-Line class 100 clean room oven

  • Spin coater: Headway Research PWM32-PS-R790

  • Mask aligner: Karl Suss Microtec MA6/BA6

  • Wet bench: Clean Air Products 

  • Nanoimprintor: Nanonex NX-1000

Wet Etching

  • Wet bench: Clean Air Products

Dry Etching

  • XeF2 etcher: XACTIX Xetch e1

  • Deep reactive ion etcher (DRIE): BMR Technology DSE200 

Deposition

  • Thermal evaporator: LADD Research filament evaporator

  • Physical vapor deposition (PVD): Denton Vacuum Explorer 14 

  • Molecular vapor deposition (MVD): Applied MST

  • Deep Silicon Etcher

  • Inductively coupled plasma etcher (ICP): BMR Technology HiEtch ICP-etcher module 

Characterization

  • Microscope

  • Scanning electron microscope (SEM): Quanta FEG 450 (High Vac, Low Vac, ESEM modes)

  • Probe station: Semiprobe Semiconductor characterization system: Keithley 4200

MDL Equipment Overview

MDL Equipment OverviewMDL Equipment

Safety
  • MicroDevice Lab Safety Policy 

    The MDL management has implemented all reasonable measures to ensure that this cleanroom provides a safe and clean working environment. It is the responsibility of all users, guests and staff to act in a professional, courteous, and safe manner at all times while in the facility. Users violating the operating and safety rules of the facility or endangering the safety of them or other users will be denied further access to the laboratory at the sole discretion of the management.

  • MDL Safety Test 

  • Chemical Safety

  • PTC Proposal

  • Advisor Permission Form 

Manuals

All manuals are available from the network drive \\storage02\medist$\MDL Manuals.

Hit Windows+R
Type \\storage02\medist$
Login using your campus Domain credential
CAMPUS\YOURUSERNAME
YOUR PASSWORD

  • MVD from Applied Microstructures

  • PVD from Denton Vacuum

  • XeF Etcher from Xactix

  • Nanoimprintor from Nanonex

  • SEM from FEI

  • DRIE and ICP from BMRTek

People

Name

Research Topic

Abdus Salam Sarkar

2D materials

Chao Sui

Tissue/organ-on-chip and immunotherapy 

Elham Easy

Study of microstructure of additive manufacturing devices  

Greg Hader

Nano-sheet resonators

Hearsh Hoshing

Hibal Ahmad

Thermal conductivity

Javid Akhavan Taheri Boroujeni

3D printing

Jeric Hernandez

2D material for thermoelectric measurement

Jongyoun Son

ME Lab manager

Ke Xu

Licheng Xiao

Kyungnam Kang

MDL manager

Mengqi Fang

2D material growth

Na Liu

2D material optical property measurement

Seyed S Mohajerani

Seyed Mohammad Hosseini

3D printing

Shuai Yu

pHEMA hydrogel fabrication

Siwei Chen

MTJ fabrication

Yazhou Zhou

Yingtao Wang

Graphene device

Youmna Mahmoud

3D printing

Yunong Tang

2D materials fabrication

Zheqi Li

Carbon nanotubes

Zitao Tang

Graphene ring

User Fees

Equipment

Hourly fee $ for Stevens Users (1 hour minimum)

Hourly fee $ for External Users 

Note

Mask aligner (MA6)

50

100

PVD

50 (excluding pumping time)

100 (excluding pumping time)

user brings crucibles/targets

DRIE

100

200

ICP etcher

100

200

XeF2 etcher

50

100

Nanoimprintor

50

100

user brings mold photoresists

Probe station

50

100

O2 Plasma

50

100

Spin coater, oven, hot plates, hood

50 (exempted if using with MA6 or etchers)

100 (exempted if using with MA6 or etchers)

user brings photoresists/developers

SEM

50

100

AFM

50

100

user brings AFM tips

Equipment training

200

300

Equipment operated by staff

100 + equipment hourly fee

100 + equipment hourly fee