Burchard Lab (513) and Carnegie Lab

Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:


  • Thermal Evaporator (LADD Research)
  • Pulsed Laser Deposition System using Nd:YAG Laser (wavelength: 355nm) with a vacuum chamber
  • Critical Point Dryer (Tousimis Samdri 780A)
  • Home-built Anodic Bonding Station
  • Home-built XYZ Theta Transfer Stage
  • Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: The APCVD system has a furnace (Lindberg/Blue STF55346C) with temperature control capability up to 1100°C, which enables programmed temperature control with three different temperature zones. The system is optimized to synthesize graphene and includes a 3-inch quartz tube for a large amount of graphene material production.
  • Low Pressure Chemical Vapor Deposition (LPCVD) System: The LPCVD system (MTI OTF-1200X) includes direct drive high vacuum pump (Welch 8907A) for up to 0.4 mTorr. Both APCVD and LPCVD include mass flow controllers (Aalborg GFCS 014365) for the precise introduction of reaction gases.


  • AFM System (Nanonics MV1000 and MV2000)
  • Raman Spectrometer (Horiba XPLORA)
  • Digital Microscope (Hirox KH300LCD)
  • Goniometer/Tensiometer (Ramé-Hart Model 250)

Electrical Measurements

  • Galvanostat/Potentiostat (Princeton Applied Research 263A-1)
  • Spectrum Analyzer (Advantest R3131A)
  • Signal Waveform Generator (Agilent 33250A)
  • Digital Oscilloscope (GW-INSTEK GOS-620)
  • Source Meter (Keithley 6487) instrument)


  • Chemical Storage Refrigerator
  • Fume Hood (Saint Charles)
  • Scale (Acculab ALC 80.4)
  • Hot Plates (VWR and PMC Dataplate 720)

Clean Room

The multi-user Micro Device Laboratory (MDL) is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.