Research Facilities
Burchard Lab (513) and Carnegie Lab
Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:
Fabrication/Preparation
- Thermal Evaporator (LADD Research)
- Pulsed Laser Deposition System using Nd:YAG Laser (wavelength: 355nm) with a vacuum chamber
- Critical Point Dryer (Tousimis Samdri 780A)
- Home-built Anodic Bonding Station
- Home-built XYZ Theta Transfer Stage
- Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: The APCVD system has a furnace (Lindberg/Blue STF55346C) with temperature control capability up to 1100°C, which enables programmed temperature control with three different temperature zones. The system is optimized to synthesize graphene and includes a 3-inch quartz tube for a large amount of graphene material production.
- Low Pressure Chemical Vapor Deposition (LPCVD) System: The LPCVD system (MTI OTF-1200X) includes direct drive high vacuum pump (Welch 8907A) for up to 0.4 mTorr. Both APCVD and LPCVD include mass flow controllers (Aalborg GFCS 014365) for the precise introduction of reaction gases.
Characterization
- AFM System (Nanonics MV1000 and MV2000)
- Raman Spectrometer (Horiba XPLORA)
- Digital Microscope (Hirox KH300LCD)
- Goniometer/Tensiometer (Ramé-Hart Model 250)
Electrical Measurements
- Galvanostat/Potentiostat (Princeton Applied Research 263A-1)
- Spectrum Analyzer (Advantest R3131A)
- Signal Waveform Generator (Agilent 33250A)
- Digital Oscilloscope (GW-INSTEK GOS-620)
- Source Meter (Keithley 6487) instrument)
Additional
- Chemical Storage Refrigerator
- Fume Hood (Saint Charles)
- Scale (Acculab ALC 80.4)
- Hot Plates (VWR and PMC Dataplate 720)
Clean Room
The multi-user Micro Device Laboratory (MDL) is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.
Burchard (513) Lab Equipment Overview

Low Pressure Chemical Vapor Deposition (LPCVD) system
LPCVD Vacuum Pump

Raman Spectrometer (Horiba XPLORA)

AFM System (Nanonics MV1000 and MV2000)
Goniometer/Tensiometer (Ramé-Hart Model 250)
Galvanostat/Potentiostat (Princeton Applied Research 263A-1)
Digital Microscope (Hirox KH300LCD)
Thermal Evaporator (LADD Research)
Low Pressure Chemical Vapor Deposition (LPCVD) system
LPCVD Vacuum Pump
Mass Flow Controllers (Aalborg GFCS 014365)
Graphene Mechanical Roller
Nanomanipulator (Controller, power, and electrics)
Nanomanipulator (Probes)
PLD Vacuum Chamber
Digital Oscilloscope (GW-INSTEK GOS-620
Network Analyzer (Hewlett Packard 3577A)
Dual Output DC Power Supply (Agilent E3649A)
Scale (Acculab ALC 80.4)
DI Water Filtration System (Millipore)
Fume Hood (Labconco)
Fume Hood (Labconco)
Flammable Chemical Cabinet
Digital Hot Plate / Magnetic Stirrer (IKA C-MAG HS7)
Hot Plate (Thermo Scientific Cimarec)
Digital Hot Plate (Dataplate PMC 720 Series)
Emergency Shower/Eyewash
Carnegie Lab Equipment
Atmospheric Pressure Chemical Vapor Deposition (APCVD) System
Mass Flow Controllers (Aalborg GFCS 014365)
Critical Point Dryer (Tousimis Samdri 780A
Home Built Anodic Bonding Station
Gas Cabinet
Gas Cabinet
Fume Hood
Emergency Shower/Eyewash
DI Water Ultrafiltration System