Burchard (513) Lab and Carnegie Lab
Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including AFM system (Nanonics MV1000 and MV2000), Raman spectrometer (Horiba XPLORA), galvanostat/potentiostat (Princeton Applied Research 263A-1), digital microscope (Hirox KH300LCD), goniometer/tensiometer (Ramé-Hart Model 250), thermal evaporator (LADD Research), a pulsed laser deposition system using Nd:YAG laser (wavelength: 355nm) with a vacuum chamber, critical point dryer (Tousimis Samdri 780A), electrical measurement tools (spectrum analyzer (Advantest R3131A)), signal waveform generator (Agilent 33250A), digital oscilloscope (GW-INSTEK GOS-620), source meter (Keithley 6487) instrument), hot plates (VWR and PMC Dataplate 720), refrigerator, fume hood (Saint Charles), home built anodic bonding station, nanomanipulator (Zyvex KZ100), scale (Acculab ALC 80.4), an atmospheric pressure chemical vapor deposition (APCVD) system and a low pressure chemical vapor deposition (LPCVD) system. The APCVD system has a furnace (Lindberg/Blue STF55346C) with temperature control capability up to 1100°C, which enables programmed temperature control with three different temperature zones. The system is optimized to synthesize graphene and includes a 3-inch quartz tube for a large amount of graphene material production. The LPCVD system (MTI OTF-1200X) includes direct drive high vacuum pump (Welch 8907A) for up to 0.4 mTorr. Both APCVD and LPCVD include mass flow controllers (Aalborg GFCS 014365) for the precise introduction of reaction gases.
The multi-user Micro Device Laboratory (MDL) is housed within an 800-square-foot clean room at Stevens. The following pieces of equipment will be available within the facility for the proposed project: a complete lithography system including Mask Aligner (Karl Suss MA6), Nanoimprinter (Nanonex), Spin Coater/Drier (Headway Research), Solvent Bench (Clean Air Products), Wet Etch Bench (Clean Air Products), Laminar Hood, Hotplate System (Alpha Multiservices), Ovens (Alpha Multiservices), and Surface treatment (O2 plasma asher, UV cleaner). For nanoscale characterization: Nanomanipulator (Zyvex KZ100), Environmental Scanning Electron Microscope, two Atomic Force Microscopes (Nanonics, Pacific Nanotechnology), and Small-Angle X-ray system. For deposition: Molecular Vapor Deposition system, Physical Vapor Deposition system (Denton Vacuum), Thermal Evaporator (Ladd Research), and Sputter Coater (Pelco) are installed. In addition, Deep Reactive Ion Etcher (DRIE, BMRTek), XeF2 Etcher (Xactix), and Inductively Coupled Plasma Etcher (ICP, BMRTek) are available along with other testing equipment such as Microscope (Nikon) and Probe Station (Signatone).