 | | Nanoelectronnics and Nanomechatronics Laboratory | | |
The nanoelectronics and Nanomechatronics Laboratory led by Prof. EH Yang is equipped with extensive equipment, including electrical measurement tools (spectrum analyzer (Advantest R3131A), signal waveform generator (Agilent 33250A), digital oscilloscope (GW-INSTEK GOS-620), and a source meter (Keithley 6487) instrument), galvanostat/potentiostat (Princeton Applied Research 263A-1), digital microscope (Hirox KH300LCD), a pulsed laser deposition system using Nd:YAG laser (wavelength: 355nm) with a vacuum chamber, a chemical vapor deposition (CVD) system, a direct drive high vacuum pump (Welch 8907A), a mass flow controller (Aalborg GFCS 014365), two chemical benches with fume hoods, and an SPM system (MultiView 2000 (NSOM/SPM Tip and Sample Scan Head Assembly) with the Horiba Jobin-Yvon Xplora Raman Microscope). | | Micro Device Laboratory | | |
The multi-user Micro Device Laboratory (MDL) is located in the Carnegie Laboratory at Stevens. The following pieces of equipment are available within the facility: A complete Lithography system including Mask Aligner (Karl Suss MA6), Spin Coater/Drier (STI), Solvent Bench (Clean Air Products), Wet Etch Bench (Clean Air Products), Laminar Hood, Hotplate System (Alpha Multiservices), Ovens (Alpha Multiservices), and Surface treatment (O2 plasma asher, UV cleaner). For nanoscale characterization, a Zyvex KZ100 nanomanipulator and a Pacific Nanotechnology atomic force microscope (AFM) are available along with other testing equipments such as a microscope a Probe Station (Signatone). Further, a PVD system and a nanoimprint lithography system are installed. For micro/nano-scale etching capability, a deep reactive ion etcher (DRIE) by BMR, a XeF2 etcher (Xactix), and a BRM ICP etcher are being installed. In addition, an environmental SEM is expected to be installed in 2012.
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