Instruments
Major Equipments
- FEI CM20 field-emission S/TEM
- Zeiss 982 field-emission SEM
- Zeiss Auriga Small Dual-Beam FIB-SEM
- NanoInk DPN/Agilent NanoR AFM
- Nikon E-1000 + C1 LSCM
Supporting Equipment
- Gatan cryo-plunger
- Gatan Dry Pumping station
- Olympus optical microscope
- thermo evaporator
- sputter coater
- Leica Ultracut cryo/microtome
User Charge
FEI CM20 FE S/TEM
with a Schottky field emitter and a TWIN pole pieces objective lens : 0.282 nm point resolution, 0.144 nm line resolution, and 0.180 nm information limit at 200 kV (TEM mode), and 1.0 nm BF/DF STEM resolution.
| Aperture holder | pos.1 | pos.2 | pos.3 | pos.4 |
| Condenser 1 | 2 mm | 70 um | 50 um | 30 um |
| Condenser 2 | 150 um | 100 um | 50 um | 30 um |
| Objective | 100 um | 40 um | 20 um | 10 um |
| Select-area | 800 um | 200 um | 40 um | 10 um |
Energy Spread : <= 0.8 eV (Extr. Voltage < 3 kV) and <= 1 eV (Extr. Voltage > 3 kV)
With Gatan 792 Multi-scan CCD (1kx1k) camera
Gatan Enfina PEELS system
Gatan On-axis BF/DF STEM detector
Gatan Digi-Scan digital STEM data acquisition system
FEI Emispec digital STEM data acquisition system
Gatan cryo-shield for cryo S/TEM
off-axis TV rate camera
various room temperature and low temperature TEM holders
Regarding to basic information of becoming a self-user, hourly rate, training and etc., please click here to download the LMSI TEM Users Guide. Please contact Dr. Tsengming (Alex) Chou at 201-216-8310 if you have any questions.
coming soon......
Zeiss 982 FE-SEM with Oxford ISIS EDS system
SEM resolution : 1 nm @ 30 kV ;4 nm @ 1 kV Detectors: Convectional E-T detector, in-lens detector, 4-diodes solid-state BSE detector Oxford ISIS EDS system with 135 eV resolution and it is capable of collecting spectrum from multiples points, lines across the interface, and elemental mapping.
It also equips a home-made e-beam lithography system with 100 nm or so resolution.
Regarding to basic information of becoming a self-user, hourly rate, training and etc., please click here to download the LMSI SEM Users Guide. Please contact Dr. Tsengming (Alex) Chou at 201-216-8310 or Dr. Berton Greenberg at 201-216-5258 if you have any questions.
Zeiss Auriga Small Dual-Beam FIB-SEM
Nanotechnology Workstation
: combine both FE-SEM and HR-FIB, sample can be manipulated in nano-scale.
High Resolution FESEM
a GEMINI field-emission electron column that provides resolution of 1.0 nm @ 15 kV and 1.9 nm @ 1 kV.
This FE-SEM can:
magnification: 12x to 1000 kx
probe current: 4pA to 20 nA
HV: 0.1 to 30 kV
with in-lens SE detector, Everhart-Thornley type SE chamber detector, in-lens EsB (energy selective backscattering) detector, and a STEM BF/DF detector for the thin specimen.
N2 gas charge compensation device is also available.
High Resolution FIB
Resolution down to 2.5 nm @ 30 kV via this Cobra ion column
source: liquid metal gallium ion source
magnification: 300x to 500kx
probe current: 1 pA to 50 nA
HV: 1.0 to 30 kV
with Pt GIS (gas injection system) to provide both electron and ion beam induced deposition.
Introduction to 3D Reconstruction
Image stack of serial sectioned images at nano-scale can be produced on this system. Using Avizo 3D reconstruction and visualization platform, studies of 3D nano-structure can be achived.
High Resolution STEM Imaging
Using the retractable BF/DF STEM detector, sample can be imaged in STEM (scanning transmission electron microscopy) mode via electrons have up to 30 kV energy. It provides structure information on a thin specimen.
TEM Sample Preparation
Automatic TEM sample preparation can be done using in-situ lift out method via Kleindiek nano-manipulator (model: MM3A).
Advanced Analytical Platform
A 80 mm2 Oxford SDD (silicon drift detector) EDS system provides a high through-put and high resolution microanalysis capability.
Electron and Ion Beam Lithography
Via Nabity's NPGS system, lithography can be done via either electron or ion beam.
Cryo-capability
A Leica VCT cryo-transfer system is coming soon to provide a cryo-EM capability on this system.
NanoInk DPN / Aglient NanoR AFM
For AFM mode only using Agilent SPM Cockpit program: a simple instruction can be download here. For an official overview, click here to download the document. A guided page of using NanoR in contact mode, click here to download the document. A guided page of using NanoR in non-/close-contact mode, click here to download the document.
For DPN users, click here to download the Quick user guide prepared by NanoInk. For a complete user manual, click here to download. InkCAD program can also image the sample surface similar to SPM Cockpit program, but with a limit capability.
Nikon
E-1000 up-right florescent microscope with automatic stage control.
A high sensitive monochromatic CCD camera for florescent imaging
Nikon C-1 LSCM with 3 lasers
Regarding to basic information of becoming a self-user, hourly rate, training and etc., please click here to download the LMSI Nikon/Confocal Users Guide. Regarding to the basic laser safety information when using the Confocal system, please visit Nikon Microscopy University web-site and search for the laser safety information. Or, download the printable version of the Nikon document by clicking here. Please contact Dr. Tsengming (Alex) Chou at 201-216-8310 if you have any questions.
User Fee
| Instrument | Stevens users | with assistance | outside users | with assistance |
| TEM | $50/hr | $ 50+35/hr | $150/hr | $ 150+100/hr |
| SEM | $50/hr | $ 50+35/hr | $150/hr | $ 150+100/hr |
| AFM | $10/hr | $ 10+35/hr | $50/hr | n/a |
| Nikon* | $10/hr | $ 10+35/hr | $50/hr | n/a |
TEM training: 4 hrs of lectures and 6 to 8 hrs of hands on practice. $200 for internal Stevens users and $1000 for external users
SEM training: 2 hrs of video training, 2 to 4 hrs of hands on practice. $200 for internal Stevens users and $1000 for external users
AFM and Nikon training will be arranged separately. Please consult with LMSI staff.
*Nikon E-1000 up-right light microscope with Epi-florescent, phase contrast, and LSCM (laser-scanning confocal microscopy).